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The non electrolysis nickeling bath for acicular coat formation which non electrolysis nickeling bath and the formation mannered

机译:非电解镀镍浴及其形成的针状涂层形成用非电解镀镍浴

摘要

PROBLEM TO BE SOLVED: To improve the adhesion of the film with a resin or the like by incorporating it with Ni ions, hydrazine and glycine or the derivative thereof. ;SOLUTION: Preferably, the concn. of Ni ions in a plating bath is controlled to about 0.05 to 0.2 mol/l, the concn. of hydrazine as a reducing agent to about 0.1 to 0.2 mol/l, and the concn. of glycine or the derivative thereof as a complexing agent to about 0.1 to 0.5 mol/l. In the plating bath, Ni is reduced by the oxidation reaction of hydrazine, and, at this time, hydroxyl ions are consumed, and its pH rapidly drops. As a result, the deposition rate of Ni is made slow, therefore, the addition of boric acid as a buffer is preferable, and its concn. is controlled to about 0.1 to 0.7 mol/l. In this way, the plating bath is made stable, and the deposition rate is made high. Then, the surface form of the deposited Ni is acicular one, so that the application to an adhesion layer of an insulating layer and a conductor layer in a printed circuit board or the like is made possible.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:通过将其与Ni离子,肼和甘氨酸或其衍生物结合来提高膜与树脂等的粘合性。 ;解决方案:最好是concn。将镀浴中的Ni离子的浓度控制为约0.05至0.2mol / l,浓度。肼作为还原剂至约0.1至0.2mol / l,并​​且浓度甘氨酸或其衍生物作为络合剂的量为约0.1至0.5mol / l。在电镀浴中,Ni通过肼的氧化反应被还原,并且此时,氢氧根离子被消耗,并且其pH迅速下降。结果,使Ni的沉积速率变慢,因此,优选添加硼酸作为缓冲剂,并且其浓度较高。将其控制为约0.1至0.7mol / l。这样,可以使镀浴稳定,并且可以提高沉积速率。然后,所沉积的Ni的表面形式为针状,从而使得可以在印刷电路板等中将绝缘层和导体层应用于粘附层。版权所有:(C)2000,JPO

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