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Work function it is larger than the said diamond

机译:功函数大于所说的菱形

摘要

PROBLEM TO BE SOLVED: To decrease gate current without increasing operating voltage and enhance efficiency by forming a low work function electron emission material layer supported on the surface of a substrate and having a diameter smaller than an opening diameter of a gate layer. SOLUTION: An SiO2 layer as an insulating layer and an Mo layer 13 as a gate layer are formed on an Si substrate 11 in order, and etching treatment is conducted to expose the Si surface to form an opening 14. Then, an Al layer 15 is formed, seeding treatment is conducted, and only the Al layer 15 is selectively etched to remove it. A diamond layer 17b acting as an emitter layer is formed. Since the growth of diamond occurs in only a part 16 where seeding treatment is conducted, an emitter comprising diamond having a diameter smaller than the opening diameter of a gate. Therefore, diamond is formed in only the central part of the opening 14 contributing to anode current. Since a part of the end of a gate layer contributing to the gate current is the Si surface having a large work function, field emission is practically not generated.
机译:解决的问题:通过形成支撑在基板表面上且直径小于栅极层的开口直径的低功函数电子发射材料层,在不增加工作电压的情况下减小栅极电流并提高效率。解决方案:依次在Si基板11上形成SiO2层作为绝缘层和Mo层13作为栅极层,并进行蚀刻处理以暴露Si表面以形成开口14。然后,形成Al层15形成Al 2时,进行晶种处理,并且选择性地仅蚀刻Al层15以将其去除。形成用作发射极层的金刚石层17b。由于金刚石的生长仅在进行播种处理的部分16中发生,因此包含金刚石的发射体的直径小于栅极的开口直径。因此,仅在有助于阳极电流的开口14的中央部分形成金刚石。由于对栅极电流有贡献的栅极层的端部的一部分是功函数大的Si表面,因此实际上不产生场发射。

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