Device manufacturing method of the inspection apparatus by an electron beam inspection method, and using the testing device

摘要

It is to be understood the image projection type electron beam inspection apparatus, the primary electron optical system for irradiating a sample surface is formed into a rectangular electron beam emitted from the electron gun, to be examined with an electron beam, which is the molded and, a secondary electron optical system for converging the secondary electrons emitted from the sample, a detector for converting the optical image through the fluorescent screen secondary electrons are the converging, focusing on the line sensor, the line and a control device for controlling in conjunction with the moving speed of the stage for moving the sample, the charge transfer time needed for transferring the line images captured in the pixel rows provided on the sensor.