首页> 外国专利> IMPURITY RECOVERY METHOD AND IMPURITY RECOVERY DEVICE FOR LOCAL TRACE CHEMICAL ANALYSIS

IMPURITY RECOVERY METHOD AND IMPURITY RECOVERY DEVICE FOR LOCAL TRACE CHEMICAL ANALYSIS

机译:用于局部痕量化学分析的杂质回收方法和杂质回收装置

摘要

PROBLEM TO BE SOLVED: To solve problems in a conventional analysis, in which a semiconductor board is prone to contamination because of use of a micropipet and manual operation for fixing a local analysis mask to the semiconductor board, a gap due to use of a fixing holder simplified for preventing generation of dust results in reduction of a recovery solution because of its leakage by a capillary phenomenon from the gap or recovery with pollutant taken from the outside area of an analysis area, contamination is diluted below a detection lower limit or a contamination recovery ratio is lowered because pipetting requires a predetermined amount of solution, and an analysis background value is increased or analysis in a desired analysis area cannot be carried out accurately.;SOLUTION: In this impurity recovery device, a semiconductor specimen is turned around the center of an analysis area. The recovery solution is collected after the recovery solution held by a recovery liquid drop holder is scanned in the center point and the periphery of the analysis area.;COPYRIGHT: (C)2004,JPO
机译:要解决的问题:解决常规分析中的问题,在常规分析中,由于使用微量移液管而导致半导体板易于污染,并且需要手动操作将局部分析掩模固定到半导体板上,因此会产生间隙为防止灰尘的产生而简化的支架,由于其因间隙中的毛细现象而漏出,或者由于从分析区域的外部带走的污染物而被回收,污染被稀释到检测下限以下或污染而导致回收溶液的减少由于移液需要预定量的溶液,回收率降低,并且分析背景值增加,或者无法准确地在所需分析区域中进行分析。分析区域。在回收液滴架固定的回收液在分析区域的中心和外围进行扫描后,回收回收液。版权所有:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004069502A

    专利类型

  • 公开/公告日2004-03-04

    原文格式PDF

  • 申请/专利权人 TOSHIBA MICROELECTRONICS CORP;TOSHIBA CORP;

    申请/专利号JP20020229440

  • 发明设计人 FUNO SAKAE;

    申请日2002-08-07

  • 分类号G01N1/28;H01L21/66;

  • 国家 JP

  • 入库时间 2022-08-21 23:26:29

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号