And method of atmospheric pressure reactive atom plasma processing equipment for the modeling of the surface without damage

摘要

Methods of making and finishing equipment by modeling the material difficult to handle without causing subsurface damage is disclosed. The apparatus and method, a single crystal silicon and silica, the use of atmospheric pressure plasma mixed gas emissions as a sub-aperture polisher and other materials, for example silicon carbide is in a fusion state. In one example, removing the atomic level by the reaction of fluorine atoms with the material of the workpiece. In this example, the noble gas plasma, reactive chemical species which are made of fluorine-containing gases or other fluorocarbons as a minor component added to a hose argon matrix. The reaction product is a gas-phase compound is exposed to an etchant without redeposition on the surface to flow from the surface of the workpiece, the newly generated and a new condensed material is generated. The emissions, by moving the plasma across the workpiece along the computed path, predictable and stable reactive species that enables generation of a given surface distribution is obtained.