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Method and apparatus for performing feedback and feed-forward control using scatterometer measurement method

机译:使用散射仪测量方法进行反馈和前馈控制的方法和装置

摘要

The present invention provides a method and apparatus for performing feedback and feedforward control using a scatterometer measurement method. The semiconductor device is operated. The metrology data from the processed semiconductor device is obtained. By analyzing the acquired metrology data, error data is acquired. It is determined whether the error data is a correction to the processing of the semiconductor device. Feedback correction of the processing of the semiconductor device is performed in response to the determination that the error data deserves correction to the processing of the semiconductor device. The feedforward correction of the processing of the semiconductor device is performed in response to the determination that the error data deserves correction to the processing of the semiconductor device.
机译:本发明提供了一种用于使用散射仪测量方法执行反馈和前馈控制的方法和设备。半导体器件被操作。从处理后的半导体器件获得度量数据。通过分析获取的计量数据,获取误差数据。确定错误数据是否是对半导体器件的处理的校正。响应于确定误差数据值得对半导体器件的处理进行校正来执行对半导体器件的处理的反馈校正。响应于确定误差数据值得对半导体器件的处理进行校正来执行对半导体器件的处理的前馈校正。

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