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Method and apparatus for performing feedback and feed-forward control using scatterometer measurement method
Method and apparatus for performing feedback and feed-forward control using scatterometer measurement method
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机译:使用散射仪测量方法进行反馈和前馈控制的方法和装置
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摘要
The present invention provides a method and apparatus for performing feedback and feedforward control using a scatterometer measurement method. The semiconductor device is operated. The metrology data from the processed semiconductor device is obtained. By analyzing the acquired metrology data, error data is acquired. It is determined whether the error data is a correction to the processing of the semiconductor device. Feedback correction of the processing of the semiconductor device is performed in response to the determination that the error data deserves correction to the processing of the semiconductor device. The feedforward correction of the processing of the semiconductor device is performed in response to the determination that the error data deserves correction to the processing of the semiconductor device.
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