As cleaning modulo and the cleaning device of the base substance, and production manner of the base substance whose purity is high and the base substance for the base substance null

摘要

PURPOSE: To obtain a washing method which is effective for both of degreasing and swarf removal and with which substrates having high cleanliness are surely obtainable by immersing the substrates for photoreceptors into a washing liquid and simultaneously or successively executing application of low-frequency vibration on the washing liquid and irradiation with ultrasonic waves. ;CONSTITUTION: The substrates 1 for photoreceptor are immersed into the washing liquid 44. The application of the low-frequency vibration on the washing liquid 4 and the irradiation of the washing liquid with the ultrasonic waves are simultaneously or successively executed by a vibration stirring machine 5 and an ultrasonic oscillator 9, by which the substrates 1 are washed. Namely, the low-frequency vibration is diffused over the entire part of the washing liquid 4 by this washing method and, therefore, the washing liquid 4 which comes into contact with the surfaces of the substrates 1 are replaced at all times. The partial high-concn. state of the oil-components desorbed from the substrate 1 surfaces is consequently rapidly eliminated and such elimination is effective mainly for degreasing. On the other hand, the irradiation with the ultrasonic waves is effective for heating down the deposits of the substrate 1 surfaces by a cavitation effect and is, therefore, effective for removing mainly the swarf and dust.;COPYRIGHT: (C)1997,JPO