The cleaning basket and the cleaning housing null which are used for wafer condition work cleaning manner and particular cleaning

摘要

PROBLEM TO BE SOLVED: To allow efficient cleaning and drying of a wafer-like work and to prevent the works from sticking to each other due to surface tension during and after such wet processes as cleaning, etc. ;SOLUTION: An ingot 1 is bonded to a long base block 2, extending over the entire ingot length, which is sliced in a direction across an axial line wish at least a part of the base block 2 left out, and an obtained base block-fitted parallel work W is used as an object to processed I. It is so housed that the base block 2 is higher or lower than a basket 5, and successively undergoes through a cleaning process, a rinsing process, a process where a bonding between the base block and the body to be processed sequentially 1 is released with a remover liquid, and a drying process. For the basket 5, a means 6 which enters in the parallel interval of the work W for keeping the parallel interval of the work W is provided on an inner surface of both sidewalls.;COPYRIGHT: (C)1999,JPO