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Method for fabricating transflective color LCD device and the transflective color LCD device with thick and thin regions of color filter layer
Method for fabricating transflective color LCD device and the transflective color LCD device with thick and thin regions of color filter layer
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机译:透反彩色液晶显示装置的制造方法以及具有滤色器层的厚区域和薄区域的透反彩色液晶显示装置
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摘要
A color filter substrate includes a substrate, a plurality of buffer layers respectively on the substrate, the plurality of buffer layers being spaced apart from adjacent buffer layers with an interval such that they have the shape of a matrix, a plurality of color filter layers on the buffer layers such that the plurality of color filter layers have the shape of matrix, each color filter layer having first and second portions, the first portion disposed in the gap between two adjacent buffer layers while the second portion is disposed on upper surfaces of the two adjacent buffer layers, the plurality of color filter layers being used for the transflective LCD device; and a common electrode on the plurality of color filter layers. In fabricating the color filter layer, the first and second portions of the color filter layer are integrally formed. Therefore, a simple fabricating process is achieved.
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