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III-V single crystal as well as method of producing the same, and semiconductor device utilizing the III-V single crystal

机译:III-V单晶及其制造方法,以及使用该III-V单晶的半导体器件

摘要

By exploiting an intense correlation exhibited between the distribution of lattice distortions in a wafer and the distribution of the threshold voltages of field effect transistors, the distribution of the lattice distortions in the wafer is reduced, thereby to mitigate the distribution of the characteristics of the semiconductor elements in the wafer. The difference between the maximum value and minimum value of the lattice distortions of a III-V single crystal at a normal temperature is set to at most 4×10−5, and the density of Si atoms contained in the III-V single crystal is set to at most 1×1016 cm−3, whereby the characteristics of semiconductor elements whose parent material is the III-V single crystal can be made uniform.
机译:通过利用在晶片中的晶格畸变的分布与场效应晶体管的阈值电压的分布之间呈现出强烈的相关性,减少了晶片中的晶格畸变的分布,从而减轻了半导体特性的分布。晶片中的元素。将常温下的III-V族单晶的晶格畸变的最大值与最小值之差设为最大4×10 负-5 ,并且所含Si原子的密度III-V单晶中的N 2最多被设置为1×10 16 cm − 3 ,从而母体材料为III-V单晶的半导体元件的特性可以使晶体均匀。

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