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Micromachined structures including glass vias with internal conductive layers anodically bonded to silicon-containing substrates

机译:包括玻璃通孔的微机械结构,该玻璃通孔的内部导电层阳极键合到含硅基板上

摘要

Disclosed herein are methods of preparing vertical electrical interconnects within multiple layers of substrates, where a portion of the substrate layers are glass and a portion of the substrate layers are single-crystal silicon. The methods taught herein can be used to prepare basic “units” which can be stacked and anodically bonded together to form electrically connected, multi-unit structures. The methods of the invention are particularly advantageous in the fabrication of microcolumns, and especially an array of microcolumns of the kind used in electron optics, including electron microscopes and lithography apparatus.
机译:本文公开了在衬底的多层内制备垂直电互连的方法,其中衬底层的一部分是玻璃并且衬底层的一部分是单晶硅。本文教导的方法可用于制备基本的“单元”。它可以堆叠并阳极结合在一起以形成电连接的多单元结构。本发明的方法在微柱的制造中特别有利,特别是在包括电子显微镜和光刻设备在内的电子光学中使用的微柱阵列的制造。

著录项

  • 公开/公告号US6759309B2

    专利类型

  • 公开/公告日2004-07-06

    原文格式PDF

  • 申请/专利权人 APPLIED MATERIALS INC.;

    申请/专利号US20020160215

  • 发明设计人 HARALD S. GROSS;

    申请日2002-05-28

  • 分类号H01L213/00;

  • 国家 US

  • 入库时间 2022-08-21 23:16:00

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