Wave surface aberration measurement device, wave surface aberration measurement method, and projection lens fabricated by the device and the method

摘要

A method and apparatus for measuring a wave front aberration of a projection lens with high precision and a related calibration method. The apparatus includes: either a light source and an element producing a first point source in combination with the light source or a first point source generating part; a magnifying projection optical system projecting and magnifying a point image of the first point source projected by a test object; a detector detecting the magnified point image projected and magnified by the magnifying projection optical system; a supporting member supporting the magnifying projection optical system and the detector; a calculating part calculating a wave front aberration; and either a second point source producing element or a second point source generating part.