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Optical component and method of inducing a desired alteration of an optical property therein

机译:光学部件和在其中引起所需光学性质改变的方法

摘要

High precision optical components, for example CaF2 lenses in lithographic systems for the production of integrated circuits, often suffer from stress induced birefringence and other imperfections. For altering the optical properties in a confined region of the optical component, the latter is exposed to a beam of ions having an energy preferably in the order 100 MeV/u. This results in a modification of the optical properties due to an interaction of the ions with the surrounding medium the optical component consists of. By carefully choosing the parameters of the process, it is possible to alter the refractive index or the mechanical stress distribution or other optical properties within a confined region of this medium.
机译:高精度光学元件,例如用于生产集成电路的光刻系统中的CaF 2 透镜,经常会遭受应力引起的双折射和其他缺陷。为了改变光学部件的受限区域中的光学特性,将光学部件暴露于能量优选为100MeV / u量级的离子束。由于离子与光学组件所组成的周围介质的相互作用,这导致光学性能的改变。通过仔细选择过程的参数,可以在该介质的受限区域内改变折射率或机械应力分布或其他光学特性。

著录项

  • 公开/公告号US6728021B1

    专利类型

  • 公开/公告日2004-04-27

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号US20020299032

  • 发明设计人 ALEXANDER KOHL;HUBERT HOLDERER;

    申请日2002-11-18

  • 分类号G02F10/30;A61N50/00;

  • 国家 US

  • 入库时间 2022-08-21 23:13:14

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