Method of thin film deposition under reactive conditions with RF or pulsed DC plasma at the substrate holder

摘要

Method of thin film deposition especially in reactive conditions. Optical coatings with negligible optical absorption, of high quality and low cost even on unheated substrates are deposited using an RF/pulsed DC plasma RF/pulsed DC bias generates a plasma in front of the substrate. This plasma allows obtaining the right stoichiometry of the deposited film by increasing the reactivity of the reactive gas present in the plasma and, in addition, introduces an energetic ion bombardment of the substrate before and during the growth of the film which improves the adherence and the deposit compactness.