A polypropylene Resin composition containing a trimesico acid derivative, a method to provide a Resin with a value less than 62 of Mist, a use of trimesico acid derivative as a reducing Agent of Mist, mixtures containing Derivatives of acids trimesicos, composicione

摘要

A polypropylene Resin composition containing a trimu00e9sico acid derivative of the formula (1), a method to provide a Resin with a value of Fog is less than 62%; use of the Derivative of trimu00e9sico acid as a reducing Agent of Mist, mixtures containing derivatives d And trimu00e9sicos acids, compositions containing the compounds and mixtures trimu00e9sico acid Derivatives.Trimu00e9sico acid Derivatives of the formula (1) wherein: R1, R2 and R3 independently of each other are c1-20 alkyl, c1-20 alkyl substituted C1 - 20 alquilamino, di (c1-20 alkyl) amino - or Hydroxy 20 alquiloxi, C1; C2 - 4 {Poly (alkoxy (c)} - 4 - 20 alquenilo alkyl), C2, C3 - 12 cicloalqui The C3 - 12, cycloalkyl substituted for 1, 2 or 3 ciclohexilmetilo c1-20 alkyl,;Cyclohexylmethyl replaced by 1, 2 or 3 c1-20 alkyl; 12 cicloalquenilo C3, C3 - 12 cicloalquenilo replaced by 1, 2 or 3 c1-20 alkyl, phenyl, phenyl substituted by 1, 2 or 3 radical selected from the group consisting of C1 - 20 c1-20 alkyl, Hydroxy alquiloxi, trihalogenmeti, halogen L, trihalogenmetoxi, Benzoyl, phenylamino, acylamino and Phenylazo 5, phenyl substituted by Halogen9 fenilalquilo C7, C7 - 9 in the phenyl fenilalquilo is replaced by 1, 2 or 3 radical selected from the group consisting of c1-20 alkyl, alkoxy and C1 - 20 Hydroxy naphthyl substituted naphthyl, c1-20 alkyl, substituted Adamantyl, Adamantyl c1-20 alkyl, or heterocu00edcl Group ICO of 5 or 6 members.The polypropylene Resin compositions have excellent crystallizability, High transmittance, High Clarity, Low Fog and better thermal stability.