首页> 外国专利> Nano-fabrication method using patterned punch to contact target surface, has target surface covered with individual particles bonded to it by adhesive forces

Nano-fabrication method using patterned punch to contact target surface, has target surface covered with individual particles bonded to it by adhesive forces

机译:使用图案化打孔器接触目标表面的纳米制造方法,目标表面覆盖有通过粘附力与其结合的单个颗粒

摘要

The particles (7) used to form the pattern are individual particles bonded to the target surface (5) by adhesive forces such as electrostatic, magnetic, hydrophobic, capillary or Van der Waals forces, or covalent bonds. A method for providing surfaces with patterns on the nanometer scale or on a larger scale comprises contacting a patterned punch (3) with the target surface, the latter being covered with particles intended for building up the desired end pattern (8). Contact of the punch with the target surface will cause some of these particles to be removed, leaving the punch pattern imprinted on the target surface. The particles used to form the pattern are individual particles which are fixed to the surface in a given position by adhesive forces such as electrostatic, magnetic, hydrophobic, capillary or Van der Waals forces, or covalent bonds. Independent claims are also included for devices with a surface pattern prepared by this method.
机译:用于形成图案的颗粒(7)是通过诸如静电,磁性,疏水,毛细管或范德华力或共价键之类的粘合力结合至目标表面(5)的单个颗粒。一种用于为表面提供纳米级或更大规模图案的方法,该方法包括使图案化的冲头(3)与目标表面接触,目标表面覆盖有旨在形成所需最终图案(8)的颗粒。凸模与目标表面的接触将导致其中一些颗粒被去除,从而使凸模图案印在目标表面上。用于形成图案的颗粒是单独的颗粒,其通过诸如静电,磁性,疏水,毛细管,范德华力或共价键之类的粘合力固定在给定位置的表面上。对于通过此方法制备的具有表面图案的设备,也包括独立权利要求。

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