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FABRICATION OF MAGNESIUM DIBORIDE SUPERCONDUCTOR THIN FILMS AND ELECTRONIC DEVICES BY ION IMPLANTATION
FABRICATION OF MAGNESIUM DIBORIDE SUPERCONDUCTOR THIN FILMS AND ELECTRONIC DEVICES BY ION IMPLANTATION
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机译:离子注入法制备二硼化镁超导体薄膜和电子器件
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摘要
A process for the fabrication of superconducting magnesium diboride (MgB2) thin films and multiple layer structures is described. Single layer thin films are produced by boron ion implantation into a magnesium host, and the resulting film is annealed at 500 °C. Planar superconductor and non-superconductor interface structures can be produced by subsequential implantation steps using ion beams of different energies.
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