MATERIAL SUBJECTED TO VACUUM EVAPORATION, MgO MATERIAL SUBJECTED TO VACUUM EVAPORATION, PROCESS FOR PRODUCING THE SAME AND METHOD OF FORMING FILM

摘要

A material subjected to vacuum evaporation that enables increasing the film formation rate and enhancing the controllability of film formation rate at the film formation of the electron beam evaporation process. The material subjected to vacuum evaporation is preferably constituted of MgO. The surface roughness (Ra) of the material subjected to vacuum evaporation is preferably set so as to fall within the range of 1.0 to 10 μm. The effective surface area, taking the unevenness of surface into account, of the material subjected to vacuum evaporation is preferably set so as to fall within the range of 200 to 1200 mm2. The outline volume of the material subjected to vacuum evaporation is preferably set so as to fall within the range of 30 to 1500 mm3. This material subjected to vacuum evaporation can be produced by performing mixing and/or granulation of a powdery raw material of 50 μm or greater average particle diameter into granulation powder and press molding of the granulation powder into a molded item.