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Power Semiconductor device having high breakdown voltage low on-resistance and small switching loss

机译:击穿电压高,导通电阻低,开关损耗小的功率半导体器件

摘要

PURPOSE: A power semiconductor device with high breakdown voltage, low on-resistance and small switching loss is provided to prevent an electric field from being concentrated on both end corners of a body region by forming a body region of a stripe type and by connecting the upper and lower portion of the body region to a frame region. CONSTITUTION: A high density drain region(302) is of the first conductivity type. A low density drift region(304) of the first conductivity type is formed on the drain region. A high density drift region(306) of the first conductivity type is formed on the low density drift region. The body region(308) of the second conductivity type is formed in a predetermined region on the high density drift region. A high density source region of the first conductivity type is formed in a predetermined area on the body region. A gate insulation layer(316) having a stripe type in the same direction as the body region is formed on a channel region of the body region and on the high density drift region between the body regions. A gate electrode(318) is formed on the gate insulation layer. A source electrode(320) is electrically connected to the source region. A drain electrode is electrically connected to the drain region.
机译:目的:提供具有高击穿电压,低导通电阻和小的开关损耗的功率半导体器件,以通过形成条形的体区并通过将其连接来防止电场集中在体区的两个端角上。主体区域的上部和下部到框架区域。组成:高密度漏极区(302)为第一导电类型。在漏极区域上形成第一导电类型的低密度漂移区域(304)。在低密度漂移区上形成第一导电类型的高密度漂移区(306)。第二导电类型的主体区域(308)形成在高密度漂移区域上的预定区域中。在身体区域上的预定区域中形成第一导电类型的高密度源区域。在主体区域的沟道区域上和主体区域之间的高密度漂移区域上形成具有与主体区域相同方向的条纹型的栅极绝缘层(316)。在栅绝缘层上形成栅电极(318)。源电极(320)电连接到源区域。漏电极电连接到漏区。

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