Photosensitive barrier rib paste composite having surface treated barrier rib powder with fumed silica particles fabrication method thereof and method of forming barrier rib for plasma display panel using the same

摘要

PURPOSE: A photosensitive barrier rib paste composition containing barrier rib powder surface treated with fumed silica particles is provided, which increases exposure efficiency without raising the sintering temperature of paste in forming of barrier rib pattern for plasma display panel by a photolithographic process. CONSTITUTION: The photosensitive barrier rib paste comprises 8-20wt.% of one or more of multifunctional monomers and multifunctional polymers, 5-20wt.% of binder polymer based on cellulose and acrylate, 10-23wt.% of solvent, 1-2wt.% of photoinitiator, 60-80wt.% of inorganic barrier rip powder surface treated with fumed silica, and optionally 0.5-5wt.% of additives such as photo intensifier, dispersant, silicon-based defoamer, etc. The paste is prepared by the following steps of: (i) preparing inorganic barrier rip powder(2-5micrometer) surface treated with fumed silica particles(5-500nm) by ball milling 40-60wt.% of glass frit, 10-25wt.% of ceramic powder(Al2O3, CaO, Cr2O3, etc.), 0.1-1wt.% of fumed silica particles and optionally 0.05-0.1wt.% of black pigment for 10-60min, baking mixed powder at 100-150deg.C for 10-30min, and ball milling again; (ii) preparing a photosensitive vehicle containing at least one compound selected from multifunctional monomers and multifunctional polymers, photoinitiator, additive, polymer binder and solvent; (iii) mixing prepared powder and photosensitive vehicle and dispersing. The barrier rib pattern for plasma display panel is formed by the following steps of: (i) coating the paste on the substrate coated with dielectrics in a thickness of 150-250micrometer; (ii) drying at 50-130deg.C for 5-30min.; (iii) exposing the paste to ultraviolet ray using a photomask; (iv) forming barrier rib pattern; (v) sintering at 450-600deg.C for 20-30min.