Inductively Coupled Plasma source having internal linear antenna therein coupled with magnetic fields for large area processing

摘要

PURPOSE: An ICP(Inductively Coupled Plasma) source for large area processing having an internal linear antenna applied with magnetic field is provided to be capable of improving plasma characteristics. CONSTITUTION: An ICP source for large area processing is provided with a reaction chamber(10), and a plurality of linear antennas(32) spaced apart from each other at the inner portion of the reaction chamber and electrically connected with each other. The ICP source further includes at least one magnet(42) installed adjacent to the plurality of linear antennas for promoting the spiral motion of electrons by generating magnetic field orthogonal to the electric field generated from the plurality of linear antennas. Preferably, each linear antenna is enclosed with an antenna protection pipe(30) made of quartz.