Wafer Wet Etching Apparatus Having D.I. Water Alarm System

摘要

PURPOSE: A wafer wet etching apparatus loaded with a deionized water alarm system is provided to be capable of minimizing the generation of failure at a wafer. CONSTITUTION: A wafer wet etching apparatus is provided with a flow meter(109) for indicating the flow rate of deionized water by using an indicator(207) and an indicating window(206), and a deionized water alarm system. At this time, the deionized water alarm system includes a pair of light emitting and receiving sensor(202) opposite to each other and an alarm(205) electrically connected with the light receiving sensor.