首页> 外国专利> SOLID STATE IMAGE DEVICE, SEMICONDUCTOR WAFER, MODULE FOR OPTICAL DEVICE, METHOD FOR FABRICATING SOLID STATE IMAGE DEVICE, AND METHOD FOR FABRICATING MODULE FOR OPTICAL DEVICE TO PREVENT OUTER SURROUNDINGS LIKE MOISTURE, DUST, ETC. FROM INFLUENCING SURFACE OF EFFECTIVE PIXEL AREA AND REDUCE SIZE OF SOLID STATE IMAGE DEVICE

SOLID STATE IMAGE DEVICE, SEMICONDUCTOR WAFER, MODULE FOR OPTICAL DEVICE, METHOD FOR FABRICATING SOLID STATE IMAGE DEVICE, AND METHOD FOR FABRICATING MODULE FOR OPTICAL DEVICE TO PREVENT OUTER SURROUNDINGS LIKE MOISTURE, DUST, ETC. FROM INFLUENCING SURFACE OF EFFECTIVE PIXEL AREA AND REDUCE SIZE OF SOLID STATE IMAGE DEVICE

机译:固态图像设备,半导体晶片,用于光学设备的模块,制造固态图像设备的方法以及用于制造光学设备模块以防止外部环境(如水分,粉尘等)的方法。从有效像素区域的影响表面减少固态图像设备的尺寸

摘要

PURPOSE: A solid state image device is provided to prevent outer surroundings like moisture, dust, etc. from influencing the surface of an effective pixel area and reduce the size of a solid state image device by attaching a light transmission cover having a plane dimension smaller than that of the solid state image device to a surface of the solid state image device such that the light transmission cover confronts the effective pixel area, thereby protecting the effective pixel area. CONSTITUTION: The effective pixel area(3) is formed on a surface of the solid state image device(2). The light transmission cover(4) has a plane dimension smaller than that of the solid state image device, confronting the effective pixel area. The solid state image device and the light transmission cover are attached by an adhesion part(5).
机译:目的:提供一种固态成像装置,以防止湿气,灰尘等外部环境影响有效像素区域的表面,并通过安装平面尺寸较小的透光盖来减小固态成像装置的尺寸与固态图像器件的表面相比,该固态图像器件的表面比固态图像器件的表面更厚,从而使光透射盖面对有效像素区域,从而保护有效像素区域。组成:有效像素区域(3)形成在固态图像设备(2)的表面上。透光盖(4)的平面尺寸小于固态成像装置的平面尺寸,面对有效像素区域。固态图像装置和透光盖通过粘附部(5)附接。

著录项

  • 公开/公告号KR20040071658A

    专利类型

  • 公开/公告日2004-08-12

    原文格式PDF

  • 申请/专利权人 SHARP CORPORATION;

    申请/专利号KR20040007979

  • 申请日2004-02-06

  • 分类号H01L27/146;H01L23/00;H01L31/10;

  • 国家 KR

  • 入库时间 2022-08-21 22:48:14

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