首页> 外国专利> SOLID STATE IMAGING DEVICE, SEMICONDUCTOR WAFER, OPTICAL DEVICE MODULE, METHOD OF SOLID STATE IMAGING DEVICE FABRICATION, AND METHOD OF OPTICAL DEVICE MODULE FABRICATION

SOLID STATE IMAGING DEVICE, SEMICONDUCTOR WAFER, OPTICAL DEVICE MODULE, METHOD OF SOLID STATE IMAGING DEVICE FABRICATION, AND METHOD OF OPTICAL DEVICE MODULE FABRICATION

机译:固态成像器件,半导体晶片,光学器件模块,固态成像器件制造方法以及光学器件制造方法

摘要

With the reduced size of a solid state imaging device, the invention provides: a solid state imaging device of a chip size and having good environmental durability; a semiconductor wafer used for fabricating a solid state imaging device; an optical device module incorporating a solid state imaging device; a method of solid state imaging device fabrication; and a method of optical device module fabrication. The solid state imaging device comprises: a solid state image pickup device formed on a semiconductor substrate; a light-transparent cover arranged opposite to an effective pixel region, so as to protect (the surface of) the effective pixel region formed in one surface of the solid state image pickup device against external environment; and an adhering section formed outside the effective pixel region in the one surface of the solid state image pickup device, so as to adhere the light-transparent cover and the solid state image pickup device.
机译:通过减小固态成像装置的尺寸,本发明提供:芯片尺寸且具有良好的环境耐久性的固态成像装置;用于制造固态成像装置的半导体晶片;包括固态成像装置的光学装置模块;固态成像装置的制造方法;以及光学器件模块的制造方法。固态成像装置包括:固态图像拾取装置,形成在半导体基板上;以及与有效像素区域相对设置的透光盖,以保护形成在固态图像拾取装置的一个表面中的有效像素区域(的表面)免受外部环境的影响;粘附部分形成在固态图像拾取装置的一个表面中的有效像素区域的外部,以粘附透光盖和固态图像拾取装置。

著录项

  • 公开/公告号KR100604190B1

    专利类型

  • 公开/公告日2006-07-25

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20040007979

  • 申请日2004-02-06

  • 分类号H01L27/146;H01L23;H01L31/10;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:22

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