首页> 外国专利> SEMICONDUCTOR LASER DIODE AND FABRICATING METHOD THEREOF, ESPECIALLY FORMING A WINDOW LAYER ON A PART OF AN N-CLAD LAYER AND A BOTTOM OF THE N-CLAD LAYER

SEMICONDUCTOR LASER DIODE AND FABRICATING METHOD THEREOF, ESPECIALLY FORMING A WINDOW LAYER ON A PART OF AN N-CLAD LAYER AND A BOTTOM OF THE N-CLAD LAYER

机译:半导体激光二极管及其制造方法,特别是在一部分N覆盖层和一层N覆盖层的底部形成窗口层

摘要

PURPOSE: A semiconductor laser diode and a fabricating method thereof are provided to enhance an optical output and lengthen a lifetime by forming a window layer on a part of an n-clad layer and a bottom of the n-clad layer. CONSTITUTION: An n-clad layer(21), an active layer(22), and a p-clad layer(23) are formed on an n-GaAs substrate(20). The p-clad layer is etched partially. A projected ridge is formed to the longitudinal direction of the p-clad layer. A current blocking layer(24) is formed on the etched p-clad layer. A p-cap layer(25) is formed on the ridge and the current blocking layer. A first dielectric layer is formed on the p-cap layer. A second dielectric layer is formed on the first dielectric layer. A window layer(28) is formed on the second dielectric layer. A p-pad electrode(29) and an n-pad electrode(30) are formed on the p-cap layer and a bottom of the n-GaAs substrate.
机译:目的:提供一种半导体激光二极管及其制造方法,以通过在一部分n型包层和一部分n型包层的底部上形成窗口层来提高光输出并延长寿命。组成:n-包层(21),有源层(22)和p-包层(23)形成在n-GaAs衬底(20)上。 p-包层被部分蚀刻。在p覆盖层的长度方向上形成有凸条。在蚀刻的p-包层上形成电流阻挡层(24)。在脊和电流阻挡层上形成p帽层(25)。在p-盖层上形成第一介电层。在第一介电层上形成第二介电层。在第二介电层上形成窗口层(28)。在p-盖层和n-GaAs衬底的底部上形成有p-垫电极(29)和n-垫电极(30)。

著录项

  • 公开/公告号KR20040078457A

    专利类型

  • 公开/公告日2004-09-10

    原文格式PDF

  • 申请/专利权人 LG ELECTRONICS INC.;

    申请/专利号KR20030013406

  • 发明设计人 LIM WON TAEK;

    申请日2003-03-04

  • 分类号H01S5/30;

  • 国家 KR

  • 入库时间 2022-08-21 22:48:06

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