首页> 外国专利> METHOD FOR FABRICATING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, CIRCUIT BOARD AND ELECTRONIC INSTRUMENT TO PREVENT SIGNAL LINE AND GROUND FROM BEING SHORT-CIRCUITED AND AVOID CONNECTION FAILURE OF ELECTRODES IN STACK PROCESS

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, CIRCUIT BOARD AND ELECTRONIC INSTRUMENT TO PREVENT SIGNAL LINE AND GROUND FROM BEING SHORT-CIRCUITED AND AVOID CONNECTION FAILURE OF ELECTRODES IN STACK PROCESS

机译:一种用于制造半导体器件,半导体器件,电路板和电子仪器以防止信号线和接地的方法,该方法避免了堆叠过程中电极的短路和避免连接故障

摘要

PURPOSE: A method for fabricating a semiconductor device is provided to prevent a bonded member and the back surface of a semiconductor substrate from being short-circulated even if the bonded member between electrodes is varied in stacking a semiconductor device by forming the second insulation layer in the periphery of the back surface of the semiconductor substrate while exposing the end part of the electrode to the back surface of the semiconductor substrate. CONSTITUTION: A concave part is formed from the active surface of the semiconductor substrate(10) with an integrated circuit to the inside of the semiconductor substrate. The first insulation layer(22) is formed on the inner surface of the concave part. The inside of the first insulation layer is filled with a conductive material to form an electrode(34). The back surface of the semiconductor substrate is etched to expose the end part of the first insulation layer. The second insulation layer(26) is formed on the back surface of the semiconductor substrate. The first and second insulation layers at the end part of the electrode is eliminated to expose the end part of the electrode.
机译:目的:提供一种制造半导体器件的方法,以防止在通过在半导体器件中形成第二绝缘层而堆叠半导体器件时,即使电极之间的粘合构件发生了变化,也可以防止粘合构件和半导体衬底的背面短路。在将电极的端部暴露于半导体基板的背面的同时,使半导体基板的背面的周缘部露出。构成:从具有集成电路的半导体衬底(10)的有效表面到半导体衬底的内部形成一个凹入部分。在凹部的内表面上形成有第一绝缘层(22)。第一绝缘层的内部填充有导电材料以形成电极(34)。蚀刻半导体衬底的背面以暴露第一绝缘层的端部。第二绝缘层(26)形成在半导体衬底的背面上。去除电极端部的第一绝缘层和第二绝缘层以暴露电极的端部。

著录项

  • 公开/公告号KR20040082297A

    专利类型

  • 公开/公告日2004-09-24

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORPORATION;

    申请/专利号KR20040017525

  • 发明设计人 MIYAZAWA IKUYA;

    申请日2004-03-16

  • 分类号H01L23/12;

  • 国家 KR

  • 入库时间 2022-08-21 22:47:57

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号