LITHOGRAPHIC APPARATUS, METHOD FOR FABRICATING DEVICE AND COMPUTER PROGRAM TO ELIMINATE OR IMPROVE INFLUENCE OF MIRROR INCLINATION

摘要

PURPOSE: A lithographic apparatus is provided to eliminate or improve the influence of mirror inclination by compensating for an error generated by non-planarity of a wavefront of a measurement beam. CONSTITUTION: A radiation system supplies a projection beam of X-rays. A support structure supports a patterning unit functioning to pattern the projection beam according to a necessary pattern. A substrate is held by a substrate table. A projection system projects the patterned beam to a target on the substrate. An interferometer displacement measuring system measures displacement values of transferable constitution elements of a lithographic projection apparatus and includes a model that relates sensor measurement values to the displacement values of the transferable constitution elements. The model includes at least one correction term which is a function of a variable expressing a beamshear of a measurement beam of the interferometer displacement measuring system.