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Photocathode having ultra-thin protective layer

机译:具有超薄保护层的光电阴极

摘要

A photocathode structure having a photoelectric face plate protective layer, in order to prevent a photoelectric effect from being deteriorated sharply due to a high reaction of oxygen with respect to most of existing photoelectric face plate materials when the photoelectric face plate used for generating photoelectrons by a photoelectric effect is exposed to the atmosphere, is provided. For example, a diamond-like carbon thin layer is used as a photocathode protective layer, to thereby perform a function of protection of the photoelectric face plate through isolation of the photoelectric face plate from the atmosphere and enable electrons generated from the photoelectric face plate to pass through a diamond-like carbon thin layer, which is deposited thinly, by the tunneling effect so that the performance of the photocathode is not affected. By using the protective layer, the processes subsequent to the photoelectric face plate deposition process can be freely performed in the atmosphere, to thereby simplify the whole process. As a result, a production cost is lowered, and manufacturing of a device or apparatus using a large-are photocathode is facilitated.
机译:具有光电面板保护层的光电阴极结构,以防止当通过电子束产生光电子所用的光电面板时,相对于大多数现有的光电面板材料,由于氧的高反应而导致光电效应急剧恶化。提供了光电效应暴露于大气。例如,将类金刚石碳薄层用作光电阴极保护层,从而通过使光电面板与大气隔离来执行保护光电面板的功能,并使从光电面板产生的电子能够通过隧穿效应穿过薄薄沉积的类金刚石碳薄层,从而不影响光电阴极的性能。通过使用保护层,可以在大气中自由地进行光电面板沉积工艺之后的工艺,从而简化了整个工艺。结果,降低了生产成本,并且促进了使用大面积光电阴极的装置或设备的制造。

著录项

  • 公开/公告号KR100423849B1

    专利类型

  • 公开/公告日2004-03-22

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20010055835

  • 发明设计人 임굉수;김상수;전덕영;이창현;

    申请日2001-09-11

  • 分类号H01J1/30;

  • 国家 KR

  • 入库时间 2022-08-21 22:47:22

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