Production of a layer arrangement comprises forming a laterally limited first layer sequence on a first surface region of a substrate and a second laterally limited second layer

摘要

Production of a layer arrangement comprises forming a laterally limited first layer sequence on a first surface region (201a) of a substrate (201) and a second laterally limited second layer sequence on a second surface region (201b) of the substrate, forming a first sidewall layer (215) of first thickness made from a first electrically insulating material on a partial region of the side walls of the first and second layer sequences, forming a second sidewall layer (217) of second thickness made from a second electrically insulating material on a partial region of the first side wall layers of the first and second layer sequences, and removing the second sidewall layers from the first layer sequence. Independent claims are also included for: (1) layer arrangement produced by the above process; and (2) storage arrangement containing the layer arrangement.