Device for electron beam attenuation of reactively formed layers on substrates comprises crucible containing chemical element, substrate to be coated and electron beam source arranged in vacuum chamber

摘要

A device for electron beam attenuation of reactively formed layers on substrates comprises a crucible (7) containing a chemical element (8), a substrate (4) to be coated and an electron beam source (10) arranged in a vacuum chamber. A screen (3) having an opening (6) for the vapor (9) directed onto the substrate is arranged between the crucible and the substrate. An element (1) for exciting, dissociating and/or ionizing a reactive gas is protected by the screen and is introduced via a gas inlet (5) arranged between the substrate and the screen. An independent claim is also included for a process for electron beam attenuation of reactively formed layers on substrates.