Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al_2O_3 for in-situ Local Structuring on Wafer Scale Substrate

摘要

A laser or electron beam assisted deposition in HV-CVD conditions was used in order to achieve structured amorphous alumina (Al_2O_3) deposits. Selective deposition of Al_2O_3 in the irradiated regions has been demonstrated. We investigate the influence of irradiation parameters on the deposition rate and composition of the deposits. The technique is aimed to be used on full wafer substrates.