首页> 外国专利> Field illumination device for projection system has parabolic reflector enclosing light source and counter-reflector lying along common optical axis with its primary focus at secondary focus of parabolic reflector

Field illumination device for projection system has parabolic reflector enclosing light source and counter-reflector lying along common optical axis with its primary focus at secondary focus of parabolic reflector

机译:用于投影系统的场照明装置具有包围光源的抛物面反射器和沿着公共光轴放置的对向反射器,其主要焦点位于抛物面反射器的次要焦点上

摘要

The field illumination device has a light source (2) enclosed by a parabolic reflector (1) and at least one counter-reflector (3) positioned on a common optical axis (4), for reflecting the light beams (9) from the light source which do not pass through the secondary focus (F1s) of the parabolic reflector back towards the latter, for reflection in the direction of the secondary focus. The reflected light beams are coupled with an optical system (5) positioned at the secondary focus for providing the illuminated field, passing through a concentric opening (6) in the counter-reflector, the primary focus (F3p) of which coincides with the secondary focus of the parabolic reflector.
机译:场照明装置具有由抛物面反射器(1)包围的光源(2)和位于公共光轴(4)上的至少一个对向反射器(3),用于反射来自光的光束(9)光源不通过抛物面反射器的次级焦点(F1s)朝后者反射,而是沿次级焦点的方向反射。反射光束与光学系统(5)耦合,该光学系统(5)穿过副反射器中的同心开口(6),该光学系统(5)通过副反射镜上的同心开口(6)提供照明场。抛物面反射镜的焦点。

著录项

  • 公开/公告号DE10235389A1

    专利类型

  • 公开/公告日2004-02-19

    原文格式PDF

  • 申请/专利权人 CARL ZEISS JENA GMBH;

    申请/专利号DE2002135389

  • 发明设计人 SCHMIDT DIETRICH;SYMANOWSKI CHRISTFRIED;

    申请日2002-08-02

  • 分类号G02B19/00;

  • 国家 DE

  • 入库时间 2022-08-21 22:44:00

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