首页> 外国专利> Process for solder-stop structuring protrusions on wafers such as three dimensional contact structures for improving integration comprises depositing a resist on the three dimensional structure, and further processing

Process for solder-stop structuring protrusions on wafers such as three dimensional contact structures for improving integration comprises depositing a resist on the three dimensional structure, and further processing

机译:用于在晶片上诸如三维接触结构的焊料停止结构化突起以改善集成的工艺包括在三维结构上沉积抗蚀剂,并进行进一步处理

摘要

Process for solder-stop structuring protrusions on wafers (3) such as three dimensional contact structures (1) in the form of elastic or flexible contact bumps comprises depositing a resist on the tip of the three dimensional structure, depositing a solder-stop layer over a metallization including the resist, and removing the resist on the tip of the three dimensional structure including the solder-stop layer covering it.
机译:用于以弹性或挠性接触凸点的形式在晶片(3)例如三维接触结构(1)上对焊料停止结构化突起的工艺包括在三维结构的尖端上沉积抗蚀剂,在其上方沉积焊料停止层包括抗蚀剂的金属化层,并在包括覆盖其的阻焊层的三维结构的尖端上除去抗蚀剂。

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