首页> 外国专利> Quasi-vertical semiconductor component e.g. diode, vertical DMOS-transistor, bipolar transistor or thyristor, with inner cells having same operating point formed in trough above buried layer

Quasi-vertical semiconductor component e.g. diode, vertical DMOS-transistor, bipolar transistor or thyristor, with inner cells having same operating point formed in trough above buried layer

机译:准垂直半导体元件,例如二极管,垂直DMOS晶体管,双极型晶体管或晶闸管,内部单元在埋层上方的沟槽中形成具有相同工作点的内部单元

摘要

The semiconductor component has 2 internal cells in a trough (7), with a buried layer (3) between the trough and the semiconductor substrate (1) and a termination zone (4) between the buried layer and the surface of the semiconductor component. The inner cells have approximately the same operating point for compensating differences between them.
机译:半导体组件在一个槽(7)中有2个内部单元,在该槽和半导体衬底(1)之间有一个埋层(3),在该埋层和半导体组件的表面之间有一个终端区(4)。内部单元具有近似相同的工作点,以补偿它们之间的差异。

著录项

  • 公开/公告号DE10243743A1

    专利类型

  • 公开/公告日2004-04-01

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE2002143743

  • 发明设计人 ESTL HANNES;DENISON MARIE;

    申请日2002-09-20

  • 分类号H01L29/73;H01L29/78;H01L29/74;H01L29/861;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:50

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