首页> 外国专利> Optical photometer comprises a reference cuvette and a measuring cuvette having the same structure and lying in the same radiation path arranged next to each other between a radiation source and a detector

Optical photometer comprises a reference cuvette and a measuring cuvette having the same structure and lying in the same radiation path arranged next to each other between a radiation source and a detector

机译:光学光度计包括具有相同结构且位于同一辐射路径中的参考比色皿和测量比色皿,所述参考比色皿和测量比色皿在放射源和检测器之间彼此相邻布置

摘要

Optical photometer comprises a reference cuvette (RC) and a measuring cuvette (MC) lying next to each other between a radiation source (EDL) and a detector. The cuvettes have the same structure and lie in the same radiation path.
机译:光学光度计包括在辐射源(EDL)和检测器之间彼此相邻放置的参考比色皿(RC)和测量比色皿(MC)。比色皿具有相同的结构,并且位于相同的辐射路径中。

著录项

  • 公开/公告号DE10255697A1

    专利类型

  • 公开/公告日2004-06-17

    原文格式PDF

  • 申请/专利权人 ABB PATENT GMBH;

    申请/专利号DE2002155697

  • 发明设计人 HORN BERTOLD;ZOECHBAUER MICHAEL;

    申请日2002-11-29

  • 分类号G01N21/17;G01N21/05;G01N21/15;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:40

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