首页> 外国专利> Process for pre-treating surfaces or bonding surfaces of substrates to be joined used in semiconductor technology comprises applying an atmospheric plasma before the bonding process is carried out

Process for pre-treating surfaces or bonding surfaces of substrates to be joined used in semiconductor technology comprises applying an atmospheric plasma before the bonding process is carried out

机译:半导体技术中用于待接合的基板的表面或接合表面的预处理的工艺包括在进行接合工艺之前施加大气等离子体

摘要

Process for pre-treating surfaces or bonding surfaces of substrates (1, 1') to be joined comprises applying an atmospheric plasma before the bonding process is carried out. An Independent claim is also included for a device for pre-treating the surfaces or bonding surfaces of the substrates comprising a unit for producing a plasma (2) through a corona discharge with high voltage electrodes (31, 32) and supports (4, 4') on which the substrates are placed.
机译:用于对待接合的基板(1、1')的表面或接合表面进行预处理的工艺包括在进行接合工艺之前施加大气等离子体。还包括用于对基板的表面或粘合表面进行预处理的装置的独立权利要求,该装置包括用于通过具有高压电极(31、32)和支撑件(4、4)的电晕放电产生等离子体(2)的单元。 ')放置基板。

著录项

  • 公开/公告号DE10256693A1

    专利类型

  • 公开/公告日2004-06-24

    原文格式PDF

  • 申请/专利权人 SUESS MICROTEC LITHOGRAPHY GMBH;

    申请/专利号DE2002156693

  • 发明设计人 OSSMANN CHRISTIAN;GABRIEL MARKUS;

    申请日2002-12-04

  • 分类号H01L21/58;H01L21/3065;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:40

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