首页> 外国专利> Determining chromatic aberration in scanning microscope, by determining scan position at which detected light has power extremes, for multiple detection wavelengths

Determining chromatic aberration in scanning microscope, by determining scan position at which detected light has power extremes, for multiple detection wavelengths

机译:通过确定多个检测波长的检测到的光具有功率极限的扫描位置,确定扫描显微镜中的色差

摘要

The method involves scanning a sample having reference structures using an illumination light beam, and detecting the light leaving the sample in dependence on the scan position at a detection wavelength or in a spectral range. The scan position is determined at which the detected light has power extremes. The light leaving the sample is detected at a further wavelength or spectral range, and further scan positions of power extremes are determined. The chromatic aberration is determined from the scan positions. An independent claim is included for a scanning microscope.
机译:该方法包括使用照明光束扫描具有参考结构的样品,并根据扫描波长在检测波长或光谱范围内检测离开样品的光。确定扫描位置,在该位置处检测到的光具有极限功率。在另一个波长或光谱范围内检测离开样品的光,并确定功率极限的其他扫描位置。从扫描位置确定色差。扫描显微镜包括独立索赔。

著录项

  • 公开/公告号DE10309911A1

    专利类型

  • 公开/公告日2004-09-16

    原文格式PDF

  • 申请/专利权人 LEICA MICROSYSTEMS HEIDELBERG GMBH;

    申请/专利号DE2003109911

  • 发明设计人 BORLINGHAUS ROLF;

    申请日2003-03-07

  • 分类号G02B21/00;

  • 国家 DE

  • 入库时间 2022-08-21 22:43:24

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