Photolithographic reduction of lens aberration effects involves carrying out two photolithography transfers of two patterns to wafer while moving plate and wafer parallel to short sides of patterns

摘要

The method involves providing a photolithography device with a first line plate with a rectangular pattern(s), carrying out a first photolithographic transfer of the pattern to a wafer while moving the plate and wafer parallel to the short pattern sides, replacing the plate with a second with a second rectangular pattern(s) and transferring this to the wafer while moving the plate and wafer in a 90 degree rotation parallel to the short sides. The method involves providing a photolithography device with a first line plate (12) with at least one rectangular pattern, providing a wafer (18) and carrying out a first photolithography to transfer the pattern to the wafer while moving the plate and wafer parallel to the short sides of the pattern, replacing the first plate with a second with at least one second rectangular pattern and transferring this to the wafer while moving the plate and wafer in a plus or minus 90 degree rotation parallel to the short sides of the pattern.