Anti-dandruff composition contains an acrylic terpolymer comprising 1-6C alkyl (meth)acrylate monomer, heterocyclic vinyl containing a nitrogen or sulfur atom(s), (meth)acrylamide, mono- or di-1-4C alkylamino-1-4C alkyl (meth)acrylate or mono- or di-1-4C alkylamino-1-4C alkyl (meth)acrylamide and monomer from urethane. Anti-dandruff composition comprises a cosmetic medium, an acrylic terpolymer comprising: (a) 5-80 (15-70, especially 40-70) wt.% 1-6C alkyl (meth)acrylate monomer; (b) 5-80 (10-70, especially 20-60) wt.% heterocyclic vinyl containing a nitrogen or sulfur atom(s), (meth)acrylamide, mono- or di-1-4C alkylamino-1-4C alkyl (meth)acrylate or mono- or di-1-4C alkylamino-1-4C alkyl (meth)acrylamide; and (c) 0.1-30 (0.1-10) wt.% monomer from urethane produced by reacting a monoethylenically unsaturated isocyanate and a nonionic surfactant including a 1,2-butylene oxide/ethylene oxide block copolymer with terminal 1-4C alkoxy, an ethylenically unsaturated surfactant monomer obtained by condensing a nonionic surfactant and an alpha , beta -unsaturated carboxylic acid (anhydride), a (meth)allyl ether of formula (III), and a urethane nonionic monomer produced by reacting a monohydric nonionic surfactant with a monoethylenically unsaturated isocyanate; and anti-dandruff agent(s) from: (1) benzethonium chloride, benzalkonium chloride, chlorhexidine, chloramine T, chloramine B, 1,3-dibromo-5,5-dimethylhydantoin, 1,3-dichloro-5,5-dimethylhydantoin, 3-bromo-1-chloro-5,5-dimethylhydantoin and N-chlorosuccinimide; (2) 1-hydroxy-2-pyridone of formula (I); (3) trihalocarbamides of formula (II); (4) triclosan ; (5) N compounds such as climbazole, ketoconazole, clortrinazole, econazole, isoconazole or miconazole; (6) antifungal polymers such as amphotricine B or nystatine; (7) selenium sulfides; and/or (8) sulfur, cadmium sulfate, allantoin, oil or wood tar, undecylenic acid, fumaric acid or allylamine. CH2CR1CH2OAmBnApR2 (III) R1 = H or CH3; A = propyleneoxy or butylenoxy; B = ethyleneoxy; n = 0-200; m, p = 0 or number smaller than n; R2 = at least 8C hydrophobic group; R3 = 1-17C alkyl, 2-17C alkenyl, 5-8C cycloalkyl, 7-9C bicycloalkyl, cycloalkyl(alkyl), aryl, aryl-1-4C alkyl, aryl-2-4C alkenyl, aryloxy-1-4C alkyl, arylmercapto-1-4C alkyl, furyl-2-4C alkenyl, 1-4C alkoxy, NO2, CN or halogen; R4 = H, 1-4C alkyl, 2-4C alkenyl, halogen, phenyl or benzyl; X = organic base or alkali(ne earth) metal; and Z = halogen or trihalo-1-4C alkyl. An Independent claim is also included for a process for treating wet or dry hair by applying the composition, then after a period of time rinsing with water.
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机译:去头皮屑组合物包含丙烯酸三元共聚物,该丙烯酸三元共聚物包含1-6C(甲基)丙烯酸烷基酯单体,含氮或硫原子的杂环乙烯基,(甲基)丙烯酰胺,单或双1-4C烷基氨基-1-4C烷基(甲基)丙烯酸酯或单-或二-1-4C烷基氨基-1-4C烷基(甲基)丙烯酰胺和来自氨基甲酸酯的单体。去头屑组合物包含化妆品介质,丙烯酸三元共聚物,其包括:(a)5-80(15-70,尤其是40-70)重量%的1-6C(甲基)丙烯酸烷基酯单体;和(b)5-80(10-70,特别是20-60)重量%的含氮或硫原子的杂环乙烯基,(甲基)丙烯酰胺,单或二-1-4C烷基氨基-1-4C烷基(甲基)丙烯酸酯或单或二1-4C烷基氨基-1-4C烷基(甲基)丙烯酰胺; (c)通过使单烯键式不饱和异氰酸酯与包括1,2-环氧丁烷/环氧乙烷嵌段共聚物的非离子表面活性剂与末端1-4C烷氧基反应的氨基甲酸酯制得的氨基甲酸酯的0.1-30(0.1-10)%。通过使非离子表面活性剂与α,β-不饱和羧酸(酸酐),式(III)的(甲基)烯丙基醚和通过使一元非离子表面活性剂与单烯键式反应生成的氨基甲酸酯非离子单体缩合而获得的烯键式不饱和表面活性剂单体不饱和异氰酸酯和去头皮屑剂,来自:(1)苄索氯铵,苯扎氯铵,氯己定,氯胺T,氯胺B,1,3-二溴-5,5-二甲基乙内酰脲,1,3-二氯-5,5-二甲基乙内酰脲,3-溴-1-氯-5,5-二甲基乙内酰脲和N-氯琥珀酰亚胺; (2)式(I)的1-羟基-2-吡啶酮; (3)式(II)的三卤代氨基甲酰胺; (4)三氯生; (5)氮化合物,例如克霉唑,酮康唑,克霉唑,益康唑,异康唑或咪康唑; (6)抗真菌聚合物,如两性霉素B或制霉菌素; (7)硫化硒;和/或(8)硫,硫酸镉,尿囊素,油或木焦油,十一碳烯酸,富马酸或烯丙胺。 CH2CR1CH2OAmBnApR2(III)R1 = H或CH3; A =丙氧基或丁烯氧基; B =亚乙氧基; n = 0-200; m,p = 0或小于n的数字; R2 =至少8C疏水基团; R 3 = 1-17C烷基,2-17C烯基,5-8C环烷基,7-9C双环烷基,环烷基(烷基),芳基,芳基-1-4C烷基,芳基-2-4C烯基,芳氧基-1-4C烷基,芳基巯基1-4C烷基,呋喃基2-4C烯基,1-4C烷氧基,NO 2,CN或卤素; R4 = H,1-4C烷基,2-4C烯基,卤素,苯基或苄基; X =有机碱或碱(土)金属; Z =卤素或三卤代1-4C烷基。还包括独立的权利要求,用于通过施用组合物然后在一段时间内用水漂洗后处理湿发或干发的方法。
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