首页> 外国专利> The alloy fe.sub.0.8 - or a low coefficient of thermal expansion in order to mask in a semi - voltage, a mask in a semi - voltage in the alloy and the tube image in color using the mask

The alloy fe.sub.0.8 - or a low coefficient of thermal expansion in order to mask in a semi - voltage, a mask in a semi - voltage in the alloy and the tube image in color using the mask

机译:合金fe.sub.0.8-或低热膨胀系数以便在半电压下进行掩膜,在半电压下在合金内进行掩膜,并使用该掩膜对管子进行彩色成像

摘要

The present invention relates to an alloy based on ni, fe - with a low coefficient of thermal expansion, in order to mask in a semi - voltage, having excellent properties of creep, comprising, in percentage by weight, 34 - 38% of ni, 0, 01 - 0, 5% mn, 0, 0003 - 0, 0015% of b, 0, 0010 - 0, 0050% of n, the remainder being fe and of the inevitable impurities, and optionally comprising, 0, 005 - 0, 20% of si and 0, 005 - 0, 030% of al. The impurities are controlled to not greater than 0, 010% c and s, and not more than 0, and 015% for the alloy is subjected, at least once, after the hot rolling / cold, to an annealing in a non-oxidizing atmosphere at 650 - 750degrec for 30 minutes to less than 5 hours, followed by annealing in order to release the stresses after the final cold-rolling. It also relates to a mask in a semi - voltage (1) using said alloy and a color image using the mask (1).
机译:本发明涉及一种基于镍,铁的合金,该合金具有低的热膨胀系数,以便在半电压下掩盖具有优异的蠕变特性的镍,该合金的重量百分比为34%至38% ,b的0、01-0、5%mn,b的0,0003-0、0015%,n的0、0010-0、0050%,其余部分为fe和不可避免的杂质,并可选地包含0、005 -0,si的20%和0、005-0,al的030%。将合金中的杂质控制为不大于0,010%c和s,并且不大于0,对于合金而言,015%在热轧/冷轧后至少进行一次非氧化退火。在650-750°C的温度下放置30分钟至不到5小时,然后进行退火以释放最终的冷轧后的应力。还涉及使用所述合金的半电压掩模(1)和使用掩模(1)的彩色图像。

著录项

  • 公开/公告号FR2800753B1

    专利类型

  • 公开/公告日2003-12-05

    原文格式PDF

  • 申请/专利权人 NIPPON MINING & METALS CO LTD;

    申请/专利号FR20000010998

  • 发明设计人 ONO TOSHIYUKI;

    申请日2000-08-28

  • 分类号C22C38/08;C21D6/00;H01J29/07;

  • 国家 FR

  • 入库时间 2022-08-21 22:39:47

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