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PROJECTING AND RECESSED PATTERN FORMING METHOD AND PROJECTING AND RECESSED PATTERN FORMING MEMBER

机译:投射和再造图案形成方法以及投射和再造图案形成成员

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a projecting and recessed pattern without generation of dust even on a large-area and stepped base plate.;SOLUTION: This projecting and recessed pattern forming method includes: a process of stacking a sheet-like base material having a particle layer on one principal plane on the base plate with the principal plane side having the particle layer brought into contact therewith; a process of removing the sheet-like base material from the base plate so that the particle layer is left on the base plate; and a process of etching the surface of the base plate taking the fine particle layer as an etching mask to form a fine projecting and recessed pattern on the surface of the base plate. The pattern forming member is used in the above method.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种即使在大面积且阶梯状的基板上也不会产生尘埃的凹凸图案的形成方法。解决方法:该凹凸图案的形成方法包括以下步骤:在基板的一个主面上具有粒子层,且与粒子层接触的主面侧的基材。从基板上除去片状基材,使粒子层残留在基板上的工序。然后,以上述微粒层作为蚀刻掩模,对上述基板的表面进行蚀刻,从而在上述基板的表面上形成微细的凹凸图案。在上述方法中使用图案形成部件。COPYRIGHT:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2005279807A

    专利类型

  • 公开/公告日2005-10-13

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP20040094985

  • 发明设计人 NAKANISHI TSUTOMU;HIRAOKA TOSHIRO;

    申请日2004-03-29

  • 分类号B82B3/00;H05B33/02;H05B33/14;

  • 国家 JP

  • 入库时间 2022-08-21 22:37:49

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