METHOD AND DEVICE FOR POSITION MEASUREMENT, EXPOSURE METHOD USING THIS POSITION MEASURING METHOD, EXPOSURE DEVICE PROVIDED WITH THIS POSITION MEASURING DEVICE, POSITION MEASURING PROGRAM FOR PERFORMING THIS POSITION MEASURING METHOD AND RECORDING MEDIUM MEMORIZED WITH THIS POSITION MEASURING PROGRAM

摘要

PROBLEM TO BE SOLVED: To measure the positional information of an alignment mark by applying an AGC on the detection signal of the alignment mark by finding out the detection signal buried in the noise signals.;SOLUTION: The image signal as the measuring signal is obtained by irradiating the area where the alignment mark AM1 of a wafer W is formed with the light flux of detection illumination light, the reflected light of which is focused on the imaging surface of the CCD camera 26. From the image signal obtained, the interval where the signal form almost flat continues more than the area of the alignment mark AM1 is extracted. The extracted signal part is amplified and determined whether the image signal is corresponding to the alignment mark AM1 or not based on the design value of the alignment mark AM1. If the image signal is determined as that of the alignment mark AM1, the alignment of the wafer W is executed. If the image signal does not corresponding to the alignment mark AM1, the interval other than the previous one is extracted, and the same acton is repeated so on.;COPYRIGHT: (C)2006,JPO&NCIPI