METHOD FOR DESIGNING HOLE PATTERN, AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a method for designing a hole pattern for improving the degree of freedom of a layout of a hole pattern and easily judging whether or not the layout of the hole pattern is acceptable.;SOLUTION: The method for designing a hole pattern aims to lay a hole pattern out on the pattern figure of a photomask to be used in an exposure step in the manufacture of a semiconductor integrated circuit. A grid is disposed on the pattern figure, the grid having the spacing smaller than the minimum pitch allowed by the design rule of the semiconductor integrated circuit, and the hole pattern is laid on the lattice points which is the intersections of the grid.;COPYRIGHT: (C)2005,JPO&NCIPI