INDIRECT ENERGIZING TYPE CONTINUOUS ELECTROLYTIC ETCHING METHOD AND INDIRECT ENERGIZING TYPE CONTINUOUS ELECTROLYTIC ETCHING APPARATUS FOR METALLIC STRIP

摘要

PROBLEM TO BE SOLVED: To provide an indirect energizing type continuous electrolytic etching method and an indirect energizing type continuous electrolytic etching apparatus for a metallic strip which realize stable treatment even under the condition of an electrolytic solution in which turbidity is increased by long time treatment.;SOLUTION: In the indirect energizing type continuous electrolytic etching method, a plurality of electrodes are arranged in the order of A system, B system, A system, B system..., and finally, A' and B' in the progressing direction of the metallic strip so as to be opposite to the etching face in which the metallic pattern is formed in the metallic strip. An electrolytic solution is filled into the space between the metallic strip and the electrode group, and, between the A system and B system electrodes, (I) voltage application in which the A system electrode functions as a cathode while a time M is 3 to 10 msec and (II) voltage application in which the A system electrode functions as the anode while a time N is 4 M to 20 Mmsec, are alternately repeated, Also, the time in which voltage is not applied to the space between the A system and B system electrodes is inserted for an α msec(α0) time when the voltage application is shifted from (I) to (II) and a β msec (β0) time when the voltage application is shifted from (II) to (I), and further, voltage application in which the A' electrode functions as the anode is performed to the space between the A' and B' electrodes.;COPYRIGHT: (C)2005,JPO&NCIPI