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PRODUCTION METHOD FOR HARDLY CHARGED GLASS SUBSTRATE, AND HARDLY CHARGED GLASS SUBSTRATE OBTAINED THEREBY

机译:硬质玻璃基板的生产方法及由此获得的硬质玻璃基板

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a hardly charged glass substrate, and the substrate obtained thereby.;SOLUTION: The method comprises placing a glass substrate G in an atmospheric pressure plasma-generating device in which a treatment object is treated by an atmospheric pressure plasma generated between a high-voltage electrode 1 and a low-voltage electrode 2, and making the substrate G hardly charged by the generated atmospheric pressure plasma.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种制备几乎不带电的玻璃基板的方法,以及由此获得的基板。解决方案:该方法包括将玻璃基板G放置在大气压等离子体发生装置中,在该装置中通过处理来处理被处理物。高压电极1和低压电极2之间产生的大气压等离子体,并使产生的大气压等离子体几乎不使基板G充电。;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005097018A

    专利类型

  • 公开/公告日2005-04-14

    原文格式PDF

  • 申请/专利权人 AIR WATER INC;

    申请/专利号JP20030330327

  • 发明设计人 KITANO KENZO;ITO SHIGEKI;AIDA SHINJI;

    申请日2003-09-22

  • 分类号C03C23/00;B01J19/08;

  • 国家 JP

  • 入库时间 2022-08-21 22:33:55

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