首页> 外国专利> GLASS SUBSTRATE WITH Ti FILM AND GLASS SUBSTRATE WITH METAL FILM USING THE SAME, PRODUCTION METHOD OF GLASS SUBSTRATE WITH Ti FILM AND GLASS SUBSTRATE WITH METAL FILM USING THE SAME, AND FLATNESS DEGREE EVALUATION METHOD OF GLASS SUBSTRATE SURFACE

GLASS SUBSTRATE WITH Ti FILM AND GLASS SUBSTRATE WITH METAL FILM USING THE SAME, PRODUCTION METHOD OF GLASS SUBSTRATE WITH Ti FILM AND GLASS SUBSTRATE WITH METAL FILM USING THE SAME, AND FLATNESS DEGREE EVALUATION METHOD OF GLASS SUBSTRATE SURFACE

机译:含钛薄膜的玻璃基质和含金属膜的玻璃基质,含钛薄膜的玻璃基质和含金属膜的玻璃基质的生产方法以及含玻璃基质表面的平整度评估方法

摘要

PROBLEM TO BE SOLVED: To provide a glass substrate with a Ti film in which, when a metal film is accumulated on the glass substrate through the Ti film, growth of a hillock associated with heat treatment hardly occurs.;SOLUTION: A glass substrate 1 with a Ti film includes: a glass substrate 2 in which the Ti film containing Ti as a main component and having a thickness of 10-100 nm is formed on a surface, and a half value width of a Ti(002) peak measured by an X-ray diffraction of the Ti film using a rocking curve method when an X ray is irradiated to the Ti film is at most 8°; and the Ti film 3 formed by sputtering on the glass substrate 2.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种具有Ti膜的玻璃基板,其中,当金属膜通过Ti膜堆积在玻璃基板上时,几乎不发生伴随热处理的小丘的生长。解决方法:玻璃基板1带有Ti膜的薄膜包括:玻璃基板2,在该玻璃基板2的表面上形成有以Ti为主要成分且厚度为10〜100nm的Ti膜,通过测定的Ti(002)峰的半峰宽。当X射线照射到Ti膜上时,使用摇摆曲线法对Ti膜进行的X射线衍射至多为8°;在玻璃基板2上通过溅射形成Ti膜3。版权所有:(C)2014,日本特许厅&INPIT

著录项

  • 公开/公告号JP2014034479A

    专利类型

  • 公开/公告日2014-02-24

    原文格式PDF

  • 申请/专利权人 ASAHI GLASS CO LTD;

    申请/专利号JP20120174896

  • 申请日2012-08-07

  • 分类号C03C17/40;C23C14/14;C03C19;C03C23;C22C9;C22C9/06;C22C9/01;C22C9/05;C22C9/10;

  • 国家 JP

  • 入库时间 2022-08-21 16:16:57

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