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CaF2 LENS REDUCED IN DOUBLE REFRACTION

机译:双折射减少的CaF2镜头

摘要

PROBLEM TO BE SOLVED: To improve the double refraction and uniformity of a lens in a preparation method of an optical lens suitable for an optical lithographic device using electronic radiation of a selected wavelength.;SOLUTION: An optical crystal disk has a selected crystal orientation, and the disk is suitable to use for the electromagnetic radiation of the selected wavelength, and the disk has a top face, a bottom face and thickness. The crystal orientation of the optical crystal material is measured in both of the top face and the base face of the disk, and the measured values are compared with the selected crystal orientation. The optical crystal material is trimmed from one or both sides of the surfaces so that the quantity of the optical material having the minimum inclination with the selected crystal orientation may become the maximum.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:要解决的问题:在使用选定波长的电子辐射的适用于光学光刻设备的光学透镜的制备方法中,改善透镜的双折射和均匀性。解决方案:具有选定晶体取向的光盘,该盘适合用于选定波长的电磁辐射,并且该盘具有顶面,底面和厚度。在盘的顶面和底面中都测量光学晶体材料的晶体取向,并将测量值与所选择的晶体取向进行比较。从表面的一侧或两侧修整光学晶体材料,以使具有与所选晶体取向的最小倾角的光学材料的数量变为最大。;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005043889A

    专利类型

  • 公开/公告日2005-02-17

    原文格式PDF

  • 申请/专利权人 CORNING INC;

    申请/专利号JP20040213040

  • 发明设计人 ABBOT III JOHN STEELE;WILCOX DAVID INSCHO;

    申请日2004-07-21

  • 分类号G02B3/00;G02B1/02;

  • 国家 JP

  • 入库时间 2022-08-21 22:32:55

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