Pattern forming apparatus certification of patterns in the fabrication of micro-lithographic pattern, or pattern formation process,

摘要

Comprising the step of collecting the spatial image of a reticle for different values ​​of the elements of a set of lithographic variables are provided. By comparing the at least one pair of space image corresponding to at least two different values, one method involves the step of identifying the presence of an abnormality in the design pattern of the reticle. A step of comparing the at least one pair of space image corresponding to at least two different values, in the alternative, the area of ​​the reticle on the lithographic process using a reticle is most susceptible for defects based on the results of the comparison and a step of identifying. By subtracting the defective non-transient from the spatial image, comparing the at least one pair of space image corresponding to at least two different values ​​and, another embodiment of the repeated defects transient on the reticle and a step of identifying the presence.