首页> 外国专利> METHOD TO ACTIVATE SILICON SURFACE, MOLECULE PATTERN GENERATED BY THE SAME, AND USE OF MOLECULE PATTERN

METHOD TO ACTIVATE SILICON SURFACE, MOLECULE PATTERN GENERATED BY THE SAME, AND USE OF MOLECULE PATTERN

机译:激活硅表面的方法,由其产生的分子模式以及分子模式的使用

摘要

PROBLEM TO BE SOLVED: To provide a method for printing and patterning a molecule on a silicon surface at a high speed by using a microcontact printing technique.;SOLUTION: The surface of a silicon substrate having an oxide film is HF-treated to make it a hydrogen end surface, and after the silicon surface has been activated through cyanuric chloride treatment, a stamp with ink including a nucleophilic group is pressed against this surface to transfer the pattern. After being cleaned by using the solvent used for ink, the surface is exposed to the molecule containing the nucleophilic group, such that the remaining activated silicon surface is passivated.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种通过使用微接触印刷技术在硅表面上高速印刷和构图分子的方法。解决方案:对具有氧化膜的硅衬底的表面进行HF处理以使其形成氢端面,并且在通过氰尿酰氯处理使硅表面活化之后,将包含亲核基团的油墨的压模压在该表面上以转印图案。在使用墨水所用的溶剂清洗后,将表面暴露于含有亲核基团的分子,从而使剩余的活化硅表面被钝化。;版权所有:(C)2005,JPO&NCIPI

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号