首页> 外国专利> MICROWAVE PLASMA-GENERATION METHOD, MICROWAVE PLASMA-GENERATION DEVICE, AND METHOD FOR MANUFACTURING DIAMOND THIN FILM BY USING THE APPARATUS

MICROWAVE PLASMA-GENERATION METHOD, MICROWAVE PLASMA-GENERATION DEVICE, AND METHOD FOR MANUFACTURING DIAMOND THIN FILM BY USING THE APPARATUS

机译:微波等离子体产生方法,微波等离子体产生装置以及使用该装置制造金刚石薄膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a microwave plasma-generation method capable of generating the plasma of high density in a wider region, by arranging several launchers in the same vacuum vessel and generating a plasma ball originating from a single plasma ball, and to provide an apparatus therefor.;SOLUTION: The microwave plasma-generation method comprises arranging a pair of launchers in the vacuum vessel 1 so as to face each other, introducing a gas for plasma generation between the facing launchers, and supplying a microwave power to each launcher to generate a plasma ball 15. The method includes the steps of supplying a microwave power from the launcher having an upside electrode plate 3u to generate a plasma ball, and gradually increasing the microwave power supplied from upper and lower launchers to enlarge the shape and increase the density of the plasma ball.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种微波等离子体产生方法,该方法能够通过将多个发射器布置在同一真空容器中并产生源自单个等离子体球的等离子体球来在更宽的区域中产生高密度的等离子体,并提供解决方案:微波等离子体产生方法包括在真空容器1中布置成彼此面对的一对发射器,在面对的发射器之间引入用于产生等离子体的气体,以及向每个发射器提供微波功率。产生等离子体球15。该方法包括以下步骤:从具有上电极板3u的发射器提供微波功率以产生等离子体球,并逐渐增加从上发射器和下发射器提供的微波功率以扩大形状并增大发射功率。等离子球的密度。;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2004346385A

    专利类型

  • 公开/公告日2004-12-09

    原文格式PDF

  • 申请/专利权人 HAMAMATSU KAGAKU GIJUTSU KENKYU SHINKOKAI;

    申请/专利号JP20030145863

  • 发明设计人 NAGATSU MASAAKI;

    申请日2003-05-23

  • 分类号C23C16/511;B01J3/00;C23C16/27;H01L21/205;H01L21/314;H05H1/46;

  • 国家 JP

  • 入库时间 2022-08-21 22:29:16

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